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AMB Express
Fig. 3 | AMB Express

Fig. 3

From: Acceleration of emergence of E. coli antibiotic resistance in a simulated sublethal concentration of copper and tetracycline co-contaminated environment

Fig. 3

Change of the minimum inhibition concentrations (MICs). a Ciprofloxacin (Cip), tetracycline (Tet), chloramphenicol (Chl), gentamicin (Gen), polymyxin B (Pol) and erythromycin (Ery)) among the original E. coli K12 in LB medium (LB-control), copper ions and tetracycline alone act or contaminated treatment; fold changes of MICs of ciprofloxacin- (b), tetracycline- (c), and chloramphenicol-resistant (d) induced by copper ion (Cu) and/or tetracycline (Tet) treatment. H: Strains exposure at high copper ion concentrations; L: Strains exposure at low copper ion concentrations

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