From: Response surface methodology (RSM) modeling to improve removal of ciprofloxacin from aqueous solutions in photocatalytic process using copper oxide nanoparticles (CuO/UV)
Optimum condition
COD removal (%)
Predicted
Experimentala
Cipro conc.
CuO dosage
pH
Lamp 8 W
Lamp 15 W
Lamp 30 W
11.2
0.08
8.17
83.79
93.18
98.90
82.23 ± 1.23
92.96 ± 1.47
96.58 ± 1.04