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Table 1 Independent variables and their ranges

From: Response surface methodology (RSM) modeling to improve removal of ciprofloxacin from aqueous solutions in photocatalytic process using copper oxide nanoparticles (CuO/UV)

Independent variables

Symbol

Levels of variables

Cipro concentration (mg/l)

X1

10–200

CuO dosage (g/l)

X2

0.01–0.1

pH

X3

3–11