From: Response surface methodology (RSM) modeling to improve removal of ciprofloxacin from aqueous solutions in photocatalytic process using copper oxide nanoparticles (CuO/UV)
Independent variables
Symbol
Levels of variables
Cipro concentration (mg/l)
X1
10–200
CuO dosage (g/l)
X2
0.01–0.1
pH
X3
3–11